What's New?

ALD Reactor CNR IMM

The Institute for Microelectronics and Microsystems (CNR-IMM/1/) in Catania, Italy is using a SI PEALD LL tool with an 8-inch wafer configuration. The integration of novel high-k gate dielectrics and passivating layers on devices based on Gallium Nitride and other wide band gap semiconductors is investigated using SENTECH PEALD tool →read more

PERC Cells measurement SENperc PV

The new innovative solution for quality control of PERC back side manufacturing is launched. The new SENperc PV was released at the SNEC Show Shanghai 2016 to the Asian market. At the Intersolar Europe, Munich (booth no. A2.214) starting at June 22, the SENperc PV will be released in Europe. You are kindly invited to our booth for live demo. →read more

ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

Upcoming Events:

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Instruments GmbH

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Germany

Phone: +49 (0)30 63 92 55 20
Fax: +49 (0)30 63 92 55 22
Email: info@sentech.de


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German sales office:
SENTECH GmbH

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Chinese sales office:
SENTECH China


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→ SENTECH Distributor NetworklinkMG