Combined Ellipsometry Reflectometry CER SE 500adv

SE500adv

Unambiguous thickness determination

The combination of ellipsometry and reflectometry allows for fast and unambiguous determination of the thickness of transparent films by automatic identifcation of the cyclic thickness period.

Largest measurement range

The CER principle extends the thickness range for transparent films up to 25 µm and more depending on photometer option.

Push the limits of laser ellipsometry

The multiple angle manual goniometer with superior performance and angle accuracy allows measuring refractive index, extinction coefficient, and film thickness of single films and layer stacks.

The SE 500adv combines ellipsometry and reflectometry to eliminate the ambiguity of measuring layer thickness of transparent films. It extends the measureable thickness to 25 µm. Therefore the SE 500adv extends the capability of the standard laser ellipsometer SE 400adv especially for analyzing thicker films of dielectrics, organic materials, photoresists, silicon, and polysilicon.

The SE 500adv can be operated as laser ellipsometer , as film thickness probe , and as CER ellipsometer SE500adv_CER
CER: Combined Ellipsometry and Reflectometry. Consequently, it offers maximum flexibility never reached by standard laser ellipsometers. Operated as ellipsometer, single and multiple angle measurements can be performed. When operated as film thickness probe, the thickness of a transparent or weakly absorbing film is measured under normal incidence.

The CER ellipsometer SE 500adv comprises the ellipsometer optics, goniometer, combined reflection measurement head and auto-collimating telescope, sample platform, HeNe laser source, laser light detection unit, and photometer.

The options SE400adv_glossar-options_150px Options: Microspots Mapping stages up to
300 x 300 mm² Liquid cells for
in-situ measurement Video camera Autofocus Motorized goniometer Simulation software Certified standard wafer of the SE 500adv support applications in microelectronics, microsystems technology, display technology, photovoltaics, chemistry, and others.

The SE 500advcombines ellipsometry and reflectometry to eliminate the ambiguity of measuring layer thickness of transparent films. It extends the measureable thickness to 25 µm. Therefore the SE 500adv extends the capability of the standard laser ellipsometer SE 400adv especially for analyzing thicker films of dielectrics, organic materials, photoresists, silicon, and polysilicon.

The SE 500adv can be operated as laser ellipsometer, as film thickness probe, and as CER ellipsometer SE500adv_CER
CER: Combined Ellipsometry and Reflectometry. Consequently, it offers maximum flexibility never reached by standard laser ellipsometers. Operated as ellipsometer, single and multiple angle measurements can be performed. When operated as film thickness probe, the thickness of a transparent or weakly absorbing film is measured under normal incidence.