Berlin, 09.03.2017

SENTECH Seminar "Plasma-Process-Technology"

Plasma_Seminar_2017_03_09

The SENTECH seminar "Plasma-Process-Technology" 2017 was once more a successful event to exchange knowledge about plasma tools and their applications. Invited speakers from industry and science gave presentations about etching, PECVD and PEALD and shared their experience with different applications.

Current topics like homogeneous deposition, low-damage and high aspect ratio etching were discussed. Roman Vitushinsky from the RAM Group at Zweibrücken showed how low-damage and slow etching significantly improves the sensitivity of NO2 sensors. Yuqing Jioa, from the COBRA Institute at the TU Eindhoven, presented the great improvement of nanophotonic integration by ultra-smooth etching. And, Adriana Szeghalmi, from the Fraunhofer IOF in Jena, showed how the great uniformity, conformity, and repeatability of the atomic layer deposition can be used for optical layers on complicated substrates (e.g. optical gratings, spherical lenses, and porous structures).

SENTECH wants to thank all participants for an interesting and successful Seminar on Plasma-Process-Technology 2017. If you want to learn more about our seminars please contact us or visit our upcoming events.