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Plasma_Seminar_2017_03_09

SENTECH seminar Plasma Process Technology 2017 was once more a successful event to exchange knowledge about plasma tools and their applications. Invited speakers from industry and science gave presentations about etching, PECVD and PEALD and shared their experience with different applications. Current topics like homogeneous deposition, low-damage and high aspect ratio etching were discussed. →read more

SENTECH wins Innovation Award 2016

SENTECH is winner of the Innovation Award 2016 Berlin Brandenburg. The SENperc PV was honored as one of the five most innovative products of 2016. The SENperc PV is used for quality control for PERC cell back side manufacturing in the photovoltaic sector. Within the ceremony on December 2, 2016 at the Henry-Ford-Building of the TU Berlin the price was handed to the SENTECH employees. →read more

ICP-RIE Plasma Etching:

Plasma_cryogenicSiPlasma_lithographyPlasma etching result of VCSEL structure using Ar-Cl2 gas mixtureEtching process result of Si-DRIE (SF6-C4F8-O2) post O2 cleanPlasma etching result of SF6-C4F8 based gas chopping process(IAP-Jena)ICP PECVD TEOS SiO2 film step coverage over Si ridge(IISB-Erlangen)ICP RIE result of SF6O2-C4F8-based Si gas chopping process

Upcoming Events:


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SENTECH
Instruments GmbH

Schwarzschildstr. 2
12489 Berlin
Germany

Phone: +49 (0)30 63 92 55 20
Fax: +49 (0)30 63 92 55 22
Email: info@sentech.de

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»Sales Manager
»Division Manager for
Plasma Process Technology
»International Sales Manager
»Service Engineer
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German sales office:
SENTECH GmbH

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Chinese sales office:
SENTECH China


Worldwide sales partners:
→ SENTECH Distributor NetworklinkMG